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ISO 21859:2019
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ISO 21859:2019
Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipmentMore info
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
| Author | ISO/TC 206 Fine ceramics |
|---|---|
| Editor | ISO |
| Document type | Standard |
| Format | Paper |
| Edition | 1 |
| Number of pages | 4 |
| Weight(kg.) | 0.1068 |
| Year | 2019 |
| Country | Switzerland |