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ASTM E2245-11(2018)
New product
ASTM E2245-11(2018)
Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical InterferometerMore info
1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.
| Author | ASTM |
|---|---|
| Editor | ASTM |
| Document type | Standard |
| Format | File |
| Confirmation date | 2018-05-01 |
| ICS | 37.040.20 : Photographic paper, films and plates. Cartridges
|
| Number of pages | 25 |
| Replace | ASTM E2245-11e1 |
| Set | ASTMVOL0301 |
| Year | 2011 |
| Document history | ASTM E2245-11e1 |
| Country | USA |
| Keyword | ASTM 2245;ASTM E2245;ASTM E2245;10.1520/E2245-11R18 |