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ASTM E1438-11

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ASTM E1438-11

Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS

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1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens.

1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution.

This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.


Significance and Use:
Author ASTM
Editor ASTM
Document type Standard
Format File
ICS 29.045 : Semiconducting materials
Number of pages 3
Replace ASTM E1438-06
Set ASTMVOL0306
Year 2011
Document history ASTM E1438-06
Country USA
Keyword ASTM 1438;ASTM E1438;ASTM E1438;10.1520/E1438-11