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1.1 This specification details the generic criteria requirements of high pure titanium sputtering targets used as thin film material for through-silicon vias (TSV) metallization in advance packaging.
| Author | ASTM |
|---|---|
| Editor | ASTM |
| Document type | Standard |
| Format | File |
| ICS | 25.220.40 : Metallic coatings
|
| Number of pages | 5 |
| Set | ASTMVOL1004 |
| Year | 2016 |
| Country | USA |
| Keyword | ASTM 3166;ASTM F3166;ASTM F3166;10.1520/F3166-16 |