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ISO 14606:2015
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ISO 14606:2015
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materialsMore info
ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.
| Author | ISO/TC 201/SC 4 Depth profiling |
|---|---|
| Editor | ISO |
| Document type | Standard |
| Format | Paper |
| Edition | 2 |
| ICS | 71.040.40 : Chemical analysis
|
| Number of pages | 16 |
| Replace | ISO 14606:2000 |
| Weight(kg.) | 0.1272 |
| Year | 2015 |
| Country | Switzerland |